XENOS XeDraw 2 High Speed Writer


  • Consists of a 10 MHz pattern generator to produce the deflection signal data for the patterns to be written by the SEM, e-beam or FIB system.

  • Implements intelligent writing schemes and shape primitives to take full benefit of limited deflection chain bandwidths.

  • Designs pattern data.

  • Produces respective deflection signals for beam steering of charged particle beams.

  • Upgrades Scanning Electron Microscope, FIB or dual beam tool systems to perform advanced nanolithography on semiconductor or other materials.

  • Comes with user-friendly and application-based ECP design and control software.

  • Can be combined with an ultra compact piezo stage (100 nm resolution) fitting without costly modifications into almost any SEM workchamber.

For more information, please view the XENOS XeDraw 2 Writer Product Sheet (783 kB .pdf file)